ULTRAPURE WATER MONITORING

Manufacturing sectors such as Semiconductor, Power Generation and Pharmaceutical require a consistent and reliable source of purified or ultrapure water (UPW). Source water is typically treated to remove impurities and condition the water for UPW processes. Trace contamination can have detrimental effects on a manufacturing process, compromising the integrity of the product.

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Real-time monitoring of source water provides feed forward information for improved UPW treatment efficiency to remove trace impurities such as organics (TOC) and UV transmittance (UVT) for UV disinfection. Monitoring at strategic points in the process can also ensure quality standards are met and trace contamination is detected for rapid correction to protect product.

Early warning of source water change
UVT monitoring on UV disinfection system
Improved ultrapure water production through process monitoring
Reduced risk of compromised product
Increased potential for reuse through monitoring

PRODUCTS:

REAL DUAL-WAVE SENSOR

Parameters Measured:
TOC, DOC, UV254,
UVT, Contaminant Alarm

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REAL SPECTRUM SENSOR

Parameters Measured:
TOC, DOC, UV254,
Contaminant Alarm, Spectral Fingerprint

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